Facilities

	Specs XPS This xps technique can be used to determine the chemical composition of material surface, as well as chemical bonding information. It must be carried out in UHV conditions. This new system also include the UPS.
	The UHV Chambers This is our main integrated ultra-high vacuum system with both in-situ material growth and characterization capabilities. It contains a laser-MBE chamber, an low-temperature crystal cleavage and preparation chamber, and main characterization chamber.
	Omicron VT-STM An Omicron Variable temperature scanning tunneling microscope is conduced on the main characterization chamber for the studies of surface morphology/structure and local electronic properties, as well as nanoscale manipulation.
	LEED This is an Omicron low energy electron diffraction setup for probing ordered lattice structure at a surface of single crystal or in-situ grown thin film.
	PLD This is a setup of UHV laser assisted molecular beam epitaxy (MBE), integrating the technique of pulsed laser deposition with a newly designed in-situ reflection high-energy electron diffraction (RHEED) instrument. This setup allows for the fabrication of oxide and other complex materials in nanoscale.
	PLD Chamber and RHEED A RHEED setup for laser MBE has two stages of differential pumping, thus allowing real-time monitoring for materials growth under high oxygen pressure.